Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review

The review discusses the most effective methods for reducing droplet density on the surface of thin films during pulsed laser deposition. This review highlights pulsed laser deposition as a promising technique for producing thin films from a wide range of materials. However, a significant challenge...

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Главные авторы:	Devitsky, O. V., Девицкий, О. В.
Формат:	Статья
Язык:	Russian
Опубликовано:	Tver State University 2025
Темы:	Pulsed laser deposition Laser energy density Thin films Droplet density Dual-pulse laser deposition Segmented target High-speed filtration
Online-ссылка:	https://dspace.ncfu.ru/handle/123456789/29608
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id	ir-123456789-29608
record_format	dspace
spelling	ir-123456789-296082025-02-04T08:28:34Z Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review Devitsky, O. V. Девицкий, О. В. Pulsed laser deposition Laser energy density Thin films Droplet density Dual-pulse laser deposition Segmented target High-speed filtration The review discusses the most effective methods for reducing droplet density on the surface of thin films during pulsed laser deposition. This review highlights pulsed laser deposition as a promising technique for producing thin films from a wide range of materials. However, a significant challenge to its industrial application is the formation of droplets on the thin film surface. The primary causes of the droplet formation are identified, and a classification of methods to reduce the droplet density during pulsed laser deposition is provided. Completely eliminating droplets without compromising the quality or altering the stoichiometric composition of the thin films is exceedingly difficult, and no researchers have achieved this to date. The most effective strategy for reducing the droplet density involves optimizing the pulsed laser deposition parameters for specific material groups. Techniques such as using a segmented crystalline target, periodically rotating it at a specific speed, and employing excimer lasers at the energy densities slightly above the ablation threshold have been shown to reduce the droplet density on the thin film surface to as low as 10 3 cm-2 . The physical and chemical processes occurring on the target surface have the greatest impact on the droplet formation. Among active methods, high-speed filtration is the most effective, capable of reducing droplet density to approximately 2 10 3 cm-2 . 2025-02-04T08:27:28Z 2025-02-04T08:27:28Z 2024 Статья Devitsky, O.V. Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review // PHYSICAL AND CHEMICAL ASPECTS OF THE STUDY OF CLUSTERS NANOSTRUCTURES AND NANOMATERIALS. - 2024. - 16. - pp.631-642. - DOI: 10.26456/pcascnn/2024.16.631 https://dspace.ncfu.ru/handle/123456789/29608 ru PHYSICAL AND CHEMICAL ASPECTS OF THE STUDY OF CLUSTERS NANOSTRUCTURES AND NANOMATERIALS application/pdf Tver State University
institution	СКФУ
collection	Репозиторий
language	Russian
topic	Pulsed laser deposition Laser energy density Thin films Droplet density Dual-pulse laser deposition Segmented target High-speed filtration
spellingShingle	Pulsed laser deposition Laser energy density Thin films Droplet density Dual-pulse laser deposition Segmented target High-speed filtration Devitsky, O. V. Девицкий, О. В. Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
description	The review discusses the most effective methods for reducing droplet density on the surface of thin films during pulsed laser deposition. This review highlights pulsed laser deposition as a promising technique for producing thin films from a wide range of materials. However, a significant challenge to its industrial application is the formation of droplets on the thin film surface. The primary causes of the droplet formation are identified, and a classification of methods to reduce the droplet density during pulsed laser deposition is provided. Completely eliminating droplets without compromising the quality or altering the stoichiometric composition of the thin films is exceedingly difficult, and no researchers have achieved this to date. The most effective strategy for reducing the droplet density involves optimizing the pulsed laser deposition parameters for specific material groups. Techniques such as using a segmented crystalline target, periodically rotating it at a specific speed, and employing excimer lasers at the energy densities slightly above the ablation threshold have been shown to reduce the droplet density on the thin film surface to as low as 10 3 cm-2 . The physical and chemical processes occurring on the target surface have the greatest impact on the droplet formation. Among active methods, high-speed filtration is the most effective, capable of reducing droplet density to approximately 2 10 3 cm-2 .
format	Статья
author	Devitsky, O. V. Девицкий, О. В.
author_facet	Devitsky, O. V. Девицкий, О. В.
author_sort	Devitsky, O. V.
title	Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
title_short	Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
title_full	Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
title_fullStr	Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
title_full_unstemmed	Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
title_sort	methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
publisher	Tver State University
publishDate	2025
url	https://dspace.ncfu.ru/handle/123456789/29608
work_keys_str_mv	AT devitskyov methodsforreducingdropletformationdensityonthesurfaceofthinsemiconductorfilmsbypulselaserdepositionreview AT devickijov methodsforreducingdropletformationdensityonthesurfaceofthinsemiconductorfilmsbypulselaserdepositionreview
_version_	1842245676702892032

Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review

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