Pulsed laser deposition OF III-V semiconductor thin films: review
This review highlights the latest advancements in pulsed laser deposition of III-V semiconductor thin films on various substrates. The pulsed laser deposition method is shown to be highly effective and distinct from other thin film deposition techniques due to its discrete nature. Epitaxial growth o...
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| Главные авторы: | Devitsky, O. V., Девицкий, О. В. |
|---|---|
| Формат: | Статья |
| Язык: | Russian |
| Опубликовано: |
Tver State University
2025
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| Темы: | |
| Online-ссылка: | https://dspace.ncfu.ru/handle/123456789/29614 |
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