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Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology

The article describes frequency characteristics of semiconductor-metal-semiconductor Si-Ag-Si structures (ohmic contacts) having metal nanolayers as well as features of resonance phenomenon and sandwich structure energy interaction. Mathematical simulation of mentioned above processes is provided. T...

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Главные авторы: Valyukhov, D. P., Валюхов, Д. П., Baklanov, I. S., Бакланов, И. С., Shtab, E. V., Штаб, Э. В., Shtab, A. V., Штаб, А. В., Pigulev, R. V., Пигулев, Р. В., Iliasov, A. S., Ильясов, А. Ш.
Formato: Статья
Idioma:English
Publicado: Institute of Physics Publishing 2020
Темы:
Acceso en liña:https://www.scopus.com/record/display.uri?eid=2-s2.0-85077954308&origin=resultslist&sort=plf-f&src=s&st1=Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology&st2=&sid=06bfe297a5d6aa23ab9ecf239eeb9ff0&sot=b&sdt=b&sl=137&s=TITLE-ABS-KEY%28Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology%29&relpos=0&citeCnt=0&searchTerm=
https://dspace.ncfu.ru/handle/20.500.12258/11217
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spelling ir-20.500.12258-112172020-01-30T08:55:07Z Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology Valyukhov, D. P. Валюхов, Д. П. Baklanov, I. S. Бакланов, И. С. Shtab, E. V. Штаб, Э. В. Shtab, A. V. Штаб, А. В. Pigulev, R. V. Пигулев, Р. В. Iliasov, A. S. Ильясов, А. Ш. Semiconducting silicon compounds Silver compounds Research laboratories Metals Natural frequencies Ohmic contacts Quality control The article describes frequency characteristics of semiconductor-metal-semiconductor Si-Ag-Si structures (ohmic contacts) having metal nanolayers as well as features of resonance phenomenon and sandwich structure energy interaction. Mathematical simulation of mentioned above processes is provided. The limiting factor for resonance process is determined. It is found that the resonance frequency is a subject of semiconductor-metal junction parameters while metal layer thickness impact is minor 2020-01-30T08:53:13Z 2020-01-30T08:53:13Z 2019 Статья Valiukhov, D.P., Baklanov, I.S., Shtab, E.V., Shtab, A.V., Pigulev, R.V., Iliasov, A.S. Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology // Journal of Physics: Conference Series. - 2019. - Volume 1384. - Issue 1. - Номер статьи 012002 https://www.scopus.com/record/display.uri?eid=2-s2.0-85077954308&origin=resultslist&sort=plf-f&src=s&st1=Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology&st2=&sid=06bfe297a5d6aa23ab9ecf239eeb9ff0&sot=b&sdt=b&sl=137&s=TITLE-ABS-KEY%28Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology%29&relpos=0&citeCnt=0&searchTerm= http://hdl.handle.net/20.500.12258/11217 en Journal of Physics: Conference Series application/pdf Institute of Physics Publishing
institution СКФУ
collection Репозиторий
language English
topic Semiconducting silicon compounds
Silver compounds
Research laboratories
Metals
Natural frequencies
Ohmic contacts
Quality control
spellingShingle Semiconducting silicon compounds
Silver compounds
Research laboratories
Metals
Natural frequencies
Ohmic contacts
Quality control
Valyukhov, D. P.
Валюхов, Д. П.
Baklanov, I. S.
Бакланов, И. С.
Shtab, E. V.
Штаб, Э. В.
Shtab, A. V.
Штаб, А. В.
Pigulev, R. V.
Пигулев, Р. В.
Iliasov, A. S.
Ильясов, А. Ш.
Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology
description The article describes frequency characteristics of semiconductor-metal-semiconductor Si-Ag-Si structures (ohmic contacts) having metal nanolayers as well as features of resonance phenomenon and sandwich structure energy interaction. Mathematical simulation of mentioned above processes is provided. The limiting factor for resonance process is determined. It is found that the resonance frequency is a subject of semiconductor-metal junction parameters while metal layer thickness impact is minor
format Статья
author Valyukhov, D. P.
Валюхов, Д. П.
Baklanov, I. S.
Бакланов, И. С.
Shtab, E. V.
Штаб, Э. В.
Shtab, A. V.
Штаб, А. В.
Pigulev, R. V.
Пигулев, Р. В.
Iliasov, A. S.
Ильясов, А. Ш.
author_facet Valyukhov, D. P.
Валюхов, Д. П.
Baklanov, I. S.
Бакланов, И. С.
Shtab, E. V.
Штаб, Э. В.
Shtab, A. V.
Штаб, А. В.
Pigulev, R. V.
Пигулев, Р. В.
Iliasov, A. S.
Ильясов, А. Ш.
author_sort Valyukhov, D. P.
title Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology
title_short Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology
title_full Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology
title_fullStr Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology
title_full_unstemmed Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology
title_sort resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology
publisher Institute of Physics Publishing
publishDate 2020
url https://www.scopus.com/record/display.uri?eid=2-s2.0-85077954308&origin=resultslist&sort=plf-f&src=s&st1=Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology&st2=&sid=06bfe297a5d6aa23ab9ecf239eeb9ff0&sot=b&sdt=b&sl=137&s=TITLE-ABS-KEY%28Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology%29&relpos=0&citeCnt=0&searchTerm=
https://dspace.ncfu.ru/handle/20.500.12258/11217
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