Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD

Within the framework of the study, fine-grained nanocrystalline aluminum nitride films were obtained using the PEALD method at the temperature of 250 degrees C and the number of deposition cycles from 80 to 500 on single-crystal silicon substrates. Low-temperature synthesis processes were carried ou...

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Auteurs principaux:	Ambartsumov, M. G., Амбарцумов, М. Г., Tarala, V. A., Тарала, В. А., Nikova, M. S., Никова, М. С., Krandievsky, S. O., Крандиевский, С. О.
Format:	Статья
Langue:	English
Publié:	Elsevier Ltd 2021
Sujets:	X-ray diffraction Spectroscopy Plasma-enhanced atomic layer deposition Microstructure Aluminum nitride Ellipsometry
Accès en ligne:	https://dspace.ncfu.ru/handle/20.500.12258/18458
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id	ir-20.500.12258-18458
record_format	dspace
spelling	ir-20.500.12258-184582022-01-24T07:31:20Z Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD Ambartsumov, M. G. Амбарцумов, М. Г. Tarala, V. A. Тарала, В. А. Nikova, M. S. Никова, М. С. Krandievsky, S. O. Крандиевский, С. О. X-ray diffraction Spectroscopy Plasma-enhanced atomic layer deposition Microstructure Aluminum nitride Ellipsometry Within the framework of the study, fine-grained nanocrystalline aluminum nitride films were obtained using the PEALD method at the temperature of 250 degrees C and the number of deposition cycles from 80 to 500 on single-crystal silicon substrates. Low-temperature synthesis processes were carried out in the self-limited growth regime of the PEALD method at the constant growth rate of similar to 0.115 nm/cycle. The obtained samples were studied by ellipsometry, FTIR-spectroscopy, X-ray diffraction analysis, Auger spectroscopy, Scanning electron and Atomic force microscopy. It was found that the samples in the IR-absorption spectra and omega/2 theta-scans had bands and reflections characteristic for wurtzite AlN with hexagonal structure. It was shown that an increase in the coating thickness led to an increase in the crystallinity and optical density of the film material, the crystallites size, and values of the root-mean-square (RMS) roughness. In this case, significant changes in the crystal lattice parameter and relaxation of internal mechanical stresses within the obtained values of the AlN layers thicknesses were not observed. 2021-11-30T10:21:40Z 2021-11-30T10:21:40Z 2021 Статья Ambartsumov, M. G., Tarala, V. A., Nikova, M. S., Krandievsky, S. O. Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD // SURFACES AND INTERFACES. - 2021. - Том 27. - Номер статьи 101559. - DOI10.1016/j.surfin.2021.101559 http://hdl.handle.net/20.500.12258/18458 en SURFACES AND INTERFACES application/pdf application/pdf Elsevier Ltd
institution	СКФУ
collection	Репозиторий
language	English
topic	X-ray diffraction Spectroscopy Plasma-enhanced atomic layer deposition Microstructure Aluminum nitride Ellipsometry
spellingShingle	X-ray diffraction Spectroscopy Plasma-enhanced atomic layer deposition Microstructure Aluminum nitride Ellipsometry Ambartsumov, M. G. Амбарцумов, М. Г. Tarala, V. A. Тарала, В. А. Nikova, M. S. Никова, М. С. Krandievsky, S. O. Крандиевский, С. О. Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
description	Within the framework of the study, fine-grained nanocrystalline aluminum nitride films were obtained using the PEALD method at the temperature of 250 degrees C and the number of deposition cycles from 80 to 500 on single-crystal silicon substrates. Low-temperature synthesis processes were carried out in the self-limited growth regime of the PEALD method at the constant growth rate of similar to 0.115 nm/cycle. The obtained samples were studied by ellipsometry, FTIR-spectroscopy, X-ray diffraction analysis, Auger spectroscopy, Scanning electron and Atomic force microscopy. It was found that the samples in the IR-absorption spectra and omega/2 theta-scans had bands and reflections characteristic for wurtzite AlN with hexagonal structure. It was shown that an increase in the coating thickness led to an increase in the crystallinity and optical density of the film material, the crystallites size, and values of the root-mean-square (RMS) roughness. In this case, significant changes in the crystal lattice parameter and relaxation of internal mechanical stresses within the obtained values of the AlN layers thicknesses were not observed.
format	Статья
author	Ambartsumov, M. G. Амбарцумов, М. Г. Tarala, V. A. Тарала, В. А. Nikova, M. S. Никова, М. С. Krandievsky, S. O. Крандиевский, С. О.
author_facet	Ambartsumov, M. G. Амбарцумов, М. Г. Tarala, V. A. Тарала, В. А. Nikova, M. S. Никова, М. С. Krandievsky, S. O. Крандиевский, С. О.
author_sort	Ambartsumov, M. G.
title	Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
title_short	Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
title_full	Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
title_fullStr	Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
title_full_unstemmed	Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
title_sort	influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature peald
publisher	Elsevier Ltd
publishDate	2021
url	https://dspace.ncfu.ru/handle/20.500.12258/18458
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Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD

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