Siirry sisältöön
Influence of magnetron sputtering conditions on the structure and surface morphology of InxGa1–xAs thin films on a GaAs (100) substrate

Influence of magnetron sputtering conditions on the structure and surface morphology of InxGa1–xAs thin films on a GaAs (100) substrate

We present the results of the study of the structure and surface morphology of In x Ga1–x As thin films on a GaAs substrate. Thin films were obtained by magnetron sputtering from a specially formed In 0.45 Ga 0.55 As target in an argon atmosphere. The obtained samples of thin films were studied by...

Täydet tiedot

Tallennettuna:
Bibliografiset tiedot
Päätekijät: Devitsky, O. V., Девицкий, О. В., Zakharov, A. A., Захаров, А. А., Lunin, L. S., Лунин, Л. С., Sysoev, I. A., Сысоев, И. А., Pashchenko, A. S., Пащенко, А. С., Vakalov, D. S., Вакалов, Д. С., Chapura, O. M., Чапура, О. М.
Aineistotyyppi: Статья
Kieli:Russian
Julkaistu: 2023
Aiheet:
Magnetron sputtering
A 3 B 5 compounds
Thin films
Surface morphology
Raman scattering
Linkit:https://dspace.ncfu.ru/handle/20.500.12258/22295
Tagit: Lisää tagi
Ei tageja, Lisää ensimmäinen tagi!

Internet

https://dspace.ncfu.ru/handle/20.500.12258/22295

Samankaltaisia teoksia