Pulsed magnetron sputtering and ion-induced annealing of carbon films

Pulsed magnetron sputtering and ion-induced annealing of carbon films

Thin carbon films are deposited on a silicon substrate at room temperatures via the biased pulsed magnetron sputtering of graphite in the physical (Ar, Kr, Xe) and reactive (Ar: CH4) modes at a different sputtering power density varying from 40 to 550 W/cm2. To ensure ion-assistance, negative bias o...

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书目详细资料
Главные авторы:	Shevchenko, E. F., Шевченко, Е. Ф., Sysoev, I. A., Сысоев, И. А.
格式:	Статья
语言:	English
出版:	Maik Nauka-Interperiodica Publishing 2018
主题:	AFM Beam lithography Carbon film Film deposition Ion annealing Magnetron sputtering Raman spectra Surface resistance
在线阅读:	https://www.scopus.com/record/display.uri?eid=2-s2.0-85017962362&origin=resultslist&sort=plf-f&src=s&nlo=1&nlr=20&nls=afprfnm-t&affilName=north+caucasus+federal+university&sid=966542d8105467f94fc40da257ddfff6&sot=afnl&sdt=sisr&sl=53&s=%28AF-ID%28%22North+Caucasus+Federal+University%22+60070541%29%29&ref=%28Pulsed+magnetron+sputtering+and+ion-induced+annealing+of+carbon+films%29&relpos=0&citeCnt=0&searchTerm= https://dspace.ncfu.ru/handle/20.500.12258/3038
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