APA(7版)引用形式
Ambartsumov, M. G., Амбарцумов, М. Г., Tarala, V. A., Тарала, В. А., Krandievsky, S. O., Крандиевский, С. О., . . . Митрофаненко, Л. М. (2019). The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles. Elsevier B.V.
Chicagoスタイル(17版)引用形式Ambartsumov, M. G., et al. The Dependence of Aluminum Nitride Thin-film Microstructure on the Number of Low-temperature Plasma-enhanced Atomic Layer Deposition Process Cycles. Elsevier B.V, 2019.
MLA(8版)引用形式Ambartsumov, M. G., et al. The Dependence of Aluminum Nitride Thin-film Microstructure on the Number of Low-temperature Plasma-enhanced Atomic Layer Deposition Process Cycles. Elsevier B.V, 2019.
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