Przejdź do treści
The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles

The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles

Within the framework of the study, oriented aluminum nitride coatings were obtained on sapphire with orientation along the direction (0001) using the PEALD method at a temperature of 250°С and a number of deposition cycles from 80 to 500. The obtained samples were studied using ellipsometry, X-ray d...

Szczegółowa specyfikacja

Zapisane w:
Opis bibliograficzny
Główni autorzy: Ambartsumov, M. G., Амбарцумов, М. Г., Tarala, V. A., Тарала, В. А., Krandievsky, S. O., Крандиевский, С. О., Kravtsov, A. A., Кравцов, А. А., Saytiev, A. B., Саутиев, А. Б., Mitrofanenko, L. M., Митрофаненко, Л. М.
Format: Статья
Język:English
Wydane: Elsevier B.V. 2019
Hasła przedmiotowe:
AFM
AlN
Atomic layer deposition
Ellipsometry
PEALD
X-ray diffraction
Aluminum coated steel
Aluminum nitride
Atomic force microscopy
Aluminum coatings
Dostęp online:https://www.scopus.com/record/display.uri?eid=2-s2.0-85075729953&origin=resultslist&sort=plf-f&src=s&st1=The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles&st2=&sid=74064f1f4b25bf0f5642e6da8f07737a&sot=b&sdt=b&sl=162&s=TITLE-ABS-KEY%28The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles%29&relpos=0&citeCnt=0&searchTerm=
https://dspace.ncfu.ru/handle/20.500.12258/9109
Etykiety: Dodaj etykietę
Nie ma etykietki, Dołącz pierwszą etykiete!

Internet

https://www.scopus.com/record/display.uri?eid=2-s2.0-85075729953&origin=resultslist&sort=plf-f&src=s&st1=The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles&st2=&sid=74064f1f4b25bf0f5642e6da8f07737a&sot=b&sdt=b&sl=162&s=TITLE-ABS-KEY%28The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles%29&relpos=0&citeCnt=0&searchTerm=
https://dspace.ncfu.ru/handle/20.500.12258/9109

Podobne zapisy