The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles
Within the framework of the study, oriented aluminum nitride coatings were obtained on sapphire with orientation along the direction (0001) using the PEALD method at a temperature of 250°С and a number of deposition cycles from 80 to 500. The obtained samples were studied using ellipsometry, X-ray d...
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| Những tác giả chính: | , , , , , , , , , , , |
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| Định dạng: | Статья |
| Ngôn ngữ: | English |
| Được phát hành: |
Elsevier B.V.
2019
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| Những chủ đề: | |
| Truy cập trực tuyến: | https://www.scopus.com/record/display.uri?eid=2-s2.0-85075729953&origin=resultslist&sort=plf-f&src=s&st1=The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles&st2=&sid=74064f1f4b25bf0f5642e6da8f07737a&sot=b&sdt=b&sl=162&s=TITLE-ABS-KEY%28The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles%29&relpos=0&citeCnt=0&searchTerm= https://dspace.ncfu.ru/handle/20.500.12258/9109 |
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https://www.scopus.com/record/display.uri?eid=2-s2.0-85075729953&origin=resultslist&sort=plf-f&src=s&st1=The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles&st2=&sid=74064f1f4b25bf0f5642e6da8f07737a&sot=b&sdt=b&sl=162&s=TITLE-ABS-KEY%28The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles%29&relpos=0&citeCnt=0&searchTerm=https://dspace.ncfu.ru/handle/20.500.12258/9109