İçeriği atla
Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition

Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition

Diğer sürümleri göster (1)

The possibility of growing oriented AlN films on Al2O3 substrates at temperatures below 300°C by plasma-enhanced atomic layer deposition was examined. The samples were subjected to X-ray phase analysis and ellipsometry. It was demonstrated that the refraction index of films deposited with plasma exp...

Ful tanımlama

Kaydedildi:
Detaylı Bibliyografya
Asıl Yazarlar: Tarala, V. A., Тарала, В. А., Altakhov, A. S., Алтахов, А. С., Ambartsumov, M. G., Амбарцумов, М. Г., Martens, V. Y., Мартенс, В. Я.
Materyal Türü: Статья
Dil:English
Baskı/Yayın Bilgisi: Maik Nauka-Interperiodica Publishing 2018
Konular:
Atomic layer deposition
Sapphire substrates
Online Erişim:https://www.scopus.com/record/display.uri?eid=2-s2.0-85013339740&origin=resultslist&sort=plf-f&src=s&nlo=&nlr=&nls=&sid=08dccdde8616d2d2d58999ab85e59422&sot=aff&sdt=sisr&sl=174&s=AF-ID%28%22North+Caucasus+Federal+University%22+60070541%29+OR+AF-ID%28%22Stavropol+State+University%22+60070961%29+OR+AF-ID%28%22stavropolskij+Gosudarstvennyj+Tehniceskij+Universitet%22+60026323%29&ref=%28Growing+oriented+AlN+films+on+sapphire+substrates+by+plasma-enhanced+atomic+layer+deposition%29&relpos=0&citeCnt=2&searchTerm=
https://dspace.ncfu.ru/handle/20.500.12258/3072
Etiketler: Etiketle
Etiket eklenmemiş, İlk siz ekleyin!

Benzer Materyaller

Benzer Materyaller