Synthesis of titanium dioxide thin films via thermo- and plasma-enhanced atomic layer deposition
Titanium dioxide thin films were deposited onto single-crystalline silicon wafers using thermal and plasma-enhanced atomic layer deposition (TALD and PEALD) techniques. The TiO2 films were subjected to investigation via ellipsometry, X-ray diffraction, Raman spectroscopy, and the use of scanning ele...
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| Hlavní autoři: | , , , , , |
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| Médium: | Статья |
| Jazyk: | English |
| Vydáno: |
Elsevier B.V.
2024
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| Témata: | |
| On-line přístup: | https://dspace.ncfu.ru/handle/123456789/28754 |
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