Synthesis of titanium dioxide thin films via thermo- and plasma-enhanced atomic layer deposition
Titanium dioxide thin films were deposited onto single-crystalline silicon wafers using thermal and plasma-enhanced atomic layer deposition (TALD and PEALD) techniques. The TiO2 films were subjected to investigation via ellipsometry, X-ray diffraction, Raman spectroscopy, and the use of scanning ele...
Gorde:
| Egile Nagusiak: | , , , , , |
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| Formatua: | Статья |
| Hizkuntza: | English |
| Argitaratua: |
Elsevier B.V.
2024
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| Gaiak: | |
| Sarrera elektronikoa: | https://dspace.ncfu.ru/handle/123456789/28754 |
| Etiketak: |
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