Ion-beam deposition of thin AlN films on Al2O3 substrate
Thin aluminum nitride (AlN) films on sapphire (Al2O3) substrates were grown by means of ion-beam deposition (IBD) and studied by methods of scanning electron microscopy, Raman scattering, and optical transmission spectroscopy. Results revealed the influence of IBD process parameters (gas mixture com...
में बचाया:
मुख्य लेखकों: | , , , , , , , |
---|---|
स्वरूप: | Статья |
भाषा: | English |
प्रकाशित: |
MAIK NAUKA/INTERPERIODICA/SPRINGER
2020
|
विषय: | |
ऑनलाइन पहुंच: | http://apps.webofknowledge.com/full_record.do?product=WOS&search_mode=GeneralSearch&qid=17&SID=E1foOAlVMmMF3jxHUZa&page=1&doc=1 https://dspace.ncfu.ru/handle/20.500.12258/11480 |
टैग : |
टैग जोड़ें
कोई टैग नहीं, इस रिकॉर्ड को टैग करने वाले पहले व्यक्ति बनें!
|
id |
ir-20.500.12258-11480 |
---|---|
record_format |
dspace |
spelling |
ir-20.500.12258-114802022-01-10T14:05:34Z Ion-beam deposition of thin AlN films on Al2O3 substrate Devitsky, O. V. Девицкий, О. В. Sysoev, I. A. Сысоев, И. А. Kasyanov, I. V. Касьянов, И. В. Nikulin, D. A. Никулин, Д. А. Ion-beam deposition Gallium nitride Sapphire Aluminum nitride Wide-bandgap semiconductors Thin aluminum nitride (AlN) films on sapphire (Al2O3) substrates were grown by means of ion-beam deposition (IBD) and studied by methods of scanning electron microscopy, Raman scattering, and optical transmission spectroscopy. Results revealed the influence of IBD process parameters (gas mixture composition, ion beam energy, and substrate temperature) on the morphology, structure, and optical properties of obtained thin AlN films on sapphire 2020-02-21T08:48:50Z 2020-02-21T08:48:50Z 2019 Статья Lunin, LS; Devitskii, OV; Sysoev, IA; Pashchenko, AS; Kas'yanov, IV; Nikulin, DA; Irkha, VA. Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate // TECHNICAL PHYSICS LETTERS. - 2019. - Том: 45. - Выпуск: 12. - Стр.: 1237-1240 http://apps.webofknowledge.com/full_record.do?product=WOS&search_mode=GeneralSearch&qid=17&SID=E1foOAlVMmMF3jxHUZa&page=1&doc=1 http://hdl.handle.net/20.500.12258/11480 en Technical Physics Letters application/pdf application/pdf MAIK NAUKA/INTERPERIODICA/SPRINGER |
institution |
СКФУ |
collection |
Репозиторий |
language |
English |
topic |
Ion-beam deposition Gallium nitride Sapphire Aluminum nitride Wide-bandgap semiconductors |
spellingShingle |
Ion-beam deposition Gallium nitride Sapphire Aluminum nitride Wide-bandgap semiconductors Devitsky, O. V. Девицкий, О. В. Sysoev, I. A. Сысоев, И. А. Kasyanov, I. V. Касьянов, И. В. Nikulin, D. A. Никулин, Д. А. Ion-beam deposition of thin AlN films on Al2O3 substrate |
description |
Thin aluminum nitride (AlN) films on sapphire (Al2O3) substrates were grown by means of ion-beam deposition (IBD) and studied by methods of scanning electron microscopy, Raman scattering, and optical transmission spectroscopy. Results revealed the influence of IBD process parameters (gas mixture composition, ion beam energy, and substrate temperature) on the morphology, structure, and optical properties of obtained thin AlN films on sapphire |
format |
Статья |
author |
Devitsky, O. V. Девицкий, О. В. Sysoev, I. A. Сысоев, И. А. Kasyanov, I. V. Касьянов, И. В. Nikulin, D. A. Никулин, Д. А. |
author_facet |
Devitsky, O. V. Девицкий, О. В. Sysoev, I. A. Сысоев, И. А. Kasyanov, I. V. Касьянов, И. В. Nikulin, D. A. Никулин, Д. А. |
author_sort |
Devitsky, O. V. |
title |
Ion-beam deposition of thin AlN films on Al2O3 substrate |
title_short |
Ion-beam deposition of thin AlN films on Al2O3 substrate |
title_full |
Ion-beam deposition of thin AlN films on Al2O3 substrate |
title_fullStr |
Ion-beam deposition of thin AlN films on Al2O3 substrate |
title_full_unstemmed |
Ion-beam deposition of thin AlN films on Al2O3 substrate |
title_sort |
ion-beam deposition of thin aln films on al2o3 substrate |
publisher |
MAIK NAUKA/INTERPERIODICA/SPRINGER |
publishDate |
2020 |
url |
http://apps.webofknowledge.com/full_record.do?product=WOS&search_mode=GeneralSearch&qid=17&SID=E1foOAlVMmMF3jxHUZa&page=1&doc=1 https://dspace.ncfu.ru/handle/20.500.12258/11480 |
work_keys_str_mv |
AT devitskyov ionbeamdepositionofthinalnfilmsonal2o3substrate AT devickijov ionbeamdepositionofthinalnfilmsonal2o3substrate AT sysoevia ionbeamdepositionofthinalnfilmsonal2o3substrate AT sysoevia ionbeamdepositionofthinalnfilmsonal2o3substrate AT kasyanoviv ionbeamdepositionofthinalnfilmsonal2o3substrate AT kasʹânoviv ionbeamdepositionofthinalnfilmsonal2o3substrate AT nikulinda ionbeamdepositionofthinalnfilmsonal2o3substrate AT nikulinda ionbeamdepositionofthinalnfilmsonal2o3substrate |
_version_ |
1760601819686371328 |