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Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD

Within the framework of the study, fine-grained nanocrystalline aluminum nitride films were obtained using the PEALD method at the temperature of 250 degrees C and the number of deposition cycles from 80 to 500 on single-crystal silicon substrates. Low-temperature synthesis processes were carried ou...

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Bibliographic Details
Main Authors: Ambartsumov, M. G., Амбарцумов, М. Г., Tarala, V. A., Тарала, В. А., Nikova, M. S., Никова, М. С., Krandievsky, S. O., Крандиевский, С. О.
Format: Статья
Language:English
Published: Elsevier Ltd 2021
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Online Access:https://dspace.ncfu.ru/handle/20.500.12258/18458
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