Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
Within the framework of the study, fine-grained nanocrystalline aluminum nitride films were obtained using the PEALD method at the temperature of 250 degrees C and the number of deposition cycles from 80 to 500 on single-crystal silicon substrates. Low-temperature synthesis processes were carried ou...
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| Päätekijät: | , , , , , , , |
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| Aineistotyyppi: | Статья |
| Kieli: | English |
| Julkaistu: |
Elsevier Ltd
2021
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| Aiheet: | |
| Linkit: | https://dspace.ncfu.ru/handle/20.500.12258/18458 |
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