Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
Within the framework of the study, fine-grained nanocrystalline aluminum nitride films were obtained using the PEALD method at the temperature of 250 degrees C and the number of deposition cycles from 80 to 500 on single-crystal silicon substrates. Low-temperature synthesis processes were carried ou...
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| Главные авторы: | , , , , , , , |
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| פורמט: | Статья |
| שפה: | English |
| יצא לאור: |
Elsevier Ltd
2021
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| נושאים: | |
| גישה מקוונת: | https://dspace.ncfu.ru/handle/20.500.12258/18458 |
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