Influence of coating thickness on the microstructure, composition and optical properties of aluminum nitride thin films grown on silicon substrates via low-temperature PEALD
Within the framework of the study, fine-grained nanocrystalline aluminum nitride films were obtained using the PEALD method at the temperature of 250 degrees C and the number of deposition cycles from 80 to 500 on single-crystal silicon substrates. Low-temperature synthesis processes were carried ou...
保存先:
主要な著者: | , , , , , , , |
---|---|
フォーマット: | Статья |
言語: | English |
出版事項: |
Elsevier Ltd
2021
|
主題: | |
オンライン・アクセス: | https://dspace.ncfu.ru/handle/20.500.12258/18458 |
タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|