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Pulsed magnetron sputtering and ion-induced annealing of carbon films

Pulsed magnetron sputtering and ion-induced annealing of carbon films

Thin carbon films are deposited on a silicon substrate at room temperatures via the biased pulsed magnetron sputtering of graphite in the physical (Ar, Kr, Xe) and reactive (Ar: CH4) modes at a different sputtering power density varying from 40 to 550 W/cm2. To ensure ion-assistance, negative bias o...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Prif Awduron: Shevchenko, E. F., Шевченко, Е. Ф., Sysoev, I. A., Сысоев, И. А.
Fformat: Статья
Iaith:English
Cyhoeddwyd: Maik Nauka-Interperiodica Publishing 2018
Pynciau:
AFM
Beam lithography
Carbon film
Film deposition
Ion annealing
Magnetron sputtering
Raman spectra
Surface resistance
Mynediad Ar-lein:https://www.scopus.com/record/display.uri?eid=2-s2.0-85017962362&origin=resultslist&sort=plf-f&src=s&nlo=1&nlr=20&nls=afprfnm-t&affilName=north+caucasus+federal+university&sid=966542d8105467f94fc40da257ddfff6&sot=afnl&sdt=sisr&sl=53&s=%28AF-ID%28%22North+Caucasus+Federal+University%22+60070541%29%29&ref=%28Pulsed+magnetron+sputtering+and+ion-induced+annealing+of+carbon+films%29&relpos=0&citeCnt=0&searchTerm=
https://dspace.ncfu.ru/handle/20.500.12258/3038
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https://www.scopus.com/record/display.uri?eid=2-s2.0-85017962362&origin=resultslist&sort=plf-f&src=s&nlo=1&nlr=20&nls=afprfnm-t&affilName=north+caucasus+federal+university&sid=966542d8105467f94fc40da257ddfff6&sot=afnl&sdt=sisr&sl=53&s=%28AF-ID%28%22North+Caucasus+Federal+University%22+60070541%29%29&ref=%28Pulsed+magnetron+sputtering+and+ion-induced+annealing+of+carbon+films%29&relpos=0&citeCnt=0&searchTerm=
https://dspace.ncfu.ru/handle/20.500.12258/3038

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